Microlithography lamps for precision manufacturing

Advanced manufacturing begins with advanced light. Our microlithography lamps deliver the precision, intensity, and optical stability required for semiconductor production, wafer processing, and other highaccuracy fabrication applications. Engineered for consistent UV performance, our technologies support the next generation of microscale innovation.

HBO lamps for advanced UV exposure

Our mercury short-arc HBO lamps, with power ratings from 200 W to 25,000 W, are essential light sources in semiconductor and electronics manufacturing. Developed through decades of research and close collaboration with industry leaders, HBO lamps offer outstanding UV emission characteristics, stability, and long operating life for critical microlithography processes.

IC / wafer lithography

HBO lamps for UV exposure lithography in integrated circuit and wafer manufacturing. 

  • Optimized for the iline spectrum (365 nm) or deep UV (254 nm) 
  • Long lifetimes with minimal performance degradation 
  • High stability for precise pattern transfer 

IC / OLED lithography

HBO lamps for UV exposure lithography in flat panel displays, OLED production, and printed circuit boards. 

  • Brightest emission in the 350–450 nm range 
  • Designed for constant power and/or constant intensity operation 
  • High UV stability for consistent imaging 

Advanced packaging

HBO lamps for advanced packaging UV exposure, MEMS production, and LED lithography. 

  • Ideal for mask aligners and wafer inspection 
  • Designed for fine structuring and advanced microfabrication 
  • Stable UV output for highprecision processes 

USHIO INE GmbH is a licensee of the OSRAM brand for certain technical and entertainment lighting products.

OSRAM is a trademark of OSRAM GmbH.